ASML (ASML) is working on the development of next generation of lithography machines to serve the chip making industry in the next decade, Nikkei Asia reported Thursday, citing the company's executive vice president of technology.

The Netherlands-based ASML and its optics partner Carl Zeiss are studying designs for machines that could print circuits with a resolution as fine as 5 nanometers in a single exposure, Jos Benschop told to Nikkei, adding that the technology would be advanced enough to serve the industry's needs from 2035 and beyond.

The company is targeting a numerical aperture of 0.7 or larger and said that no target date for launching a product has been set, Nikkei Asia said.

Numerical aperture refers to the ability of an optical system to collect and focus light, a key factor in determining how finely circuits can be printed onto wafers, Nikkei Asia said.

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