适用于先进封装无掩膜光刻，德州仪器推出 DLP991UUV 工业数字微镜

IT之家

10/04

IT之家 10 月 4 日消息，德州仪器 TI 美国当地时间 9 月 30 日推出了新款紫外波段工业数字微镜器件 DLP991UUV。其不仅可用于 3D 打印场景，还能在半导体制造过程中发挥独特作用。DLP991UUV 是一款可调制入射光幅度、方向和 / 或相位的空间光调制器 (SLM)，拥有 4096×2176 透镜阵列，微镜间距 5.4µm、对角线长度 0.99 英寸，设计用于控制波长 343...

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343...</p>\n\n<a href=\"http://gu.qq.com/resources/shy/news/detail-v2/index.html#/?id=nesSN20251004101118a6ac9fb2&s=b\">网页链接</a>\n\n</div>\n\n\n</article>\n</div>\n</body>\n</html>\n","isBrief":false,"type":0,"news_type":1,"symbol":"BK4512","symbol_name":"苹果概念","start_time":0,"source_url":"http://gu.qq.com/resources/shy/news/detail-v2/index.html#/?id=nesSN20251004101118a6ac9fb2&s=b","article_id":"2573695233","we_media_id":null,"thumbnails":[],"rights":{"source":"tencent","url":"http://gu.qq.com/resources/shy/news/detail-v2/index.html#/?id=nesSN20251004101118a6ac9fb2&s=b","rn_cache_url":null,"customStyle":"body{padding-top:10px;}#news_title{font-weight:bold;#titleStyle#;}#news_description span{font-size:12px;#descriptionStyle#;}.footer-note{#statement#}","selectors":".mod-LoadTzbdNews, body","filters":".relate-stock, .hot-list, .recom-box, 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的紫外光。这一数字微镜可用于直接成像光刻系统，无需通过掩膜就能将电路图案直写到材料上，拥有亚微米级的图案化精度，适合对分辨率要求较低但对成本敏感的先进封装领域。此外无掩膜的特质也意味着其能根据材料表面实际状态实时调整图案而无需更换掩膜耗材，加快工艺调优的同时也降低了成本。广告声明：文内含有的对外跳转链接（包括不限于超链接、二维码、口令等形式），用于传递更多信息，节省甄选时间，结果仅供参考，IT之家所有文章均包含本声明。","kind":"news","is_publish_news":true,"is_publish_highlight":false,"is_publish_live":false,"is_publish_wemedia":null,"editions":null,"column":"","sentiment":"1","news_tag":"productRelease","news_rank":0,"symbols":[],"gpt_button":1,"need_auth":false,"code":"91000000","status":"200"}}}